Disclosure of the patent for measuring the stack deformation in the SOFC/SOEC joining process
Disclosure of the SIVONIC patent for measuring the stack deformation in the SOFC/SOEC joining process using electrochemical impedance spectroscopy…
SIVONIC extends DC current range for high-current EIS
Innovation in EIS technology - SIVONIC extends DC current range for high current impedance spectroscopy (HC-EIS)
Disclosure document for temperature measurement in SOxC stacks with EIS
Disclosure document “Reduction of degradation to a stack of assembled high-temperature solid oxide cells”
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Successful participation in the Hydrogen Technology Expo in Hamburg
From October 23 to 24, 2024, the Hydrogen Technology Expo Europe took place at the Hamburg Messe. At our stand 3E50 in Hall A3, we held stimulating…