Disclosure of the patent for measuring the stack deformation in the SOFC/SOEC joining process

Disclosure of the SIVONIC patent for measuring the stack deformation in the SOFC/SOEC joining process using electrochemical impedance spectroscopy (EIS)

DE102023117366A1

The joining process in the production of solid oxide cells (SOFC/SOEC) requires maximum precision and comprehensive process control. In particular, mechanical deformation of the stack during joining at high temperatures (800-1000°C) can significantly impair the service life and efficiency of the stacks.

An innovative solution is offered by electrochemical impedance spectroscopy (EIS), which enables precise monitoring and optimization of the joining process. This method, which is described in SIVONIC patent DE102023117366A1, uses a multi-channel EIS meter to detect mechanical deformations in real time. This allows targeted adjustments to be made to the joining process in order to minimize undesirable effects.

In addition, the method allows the quality of the stacks to be classified by analyzing the strength of the deformations. Seamless integration into existing production systems not only ensures complete documentation, but also optimizes the entire production process.

Verformung_SOFC-Stack.JPG